JPH0160533U - - Google Patents
Info
- Publication number
- JPH0160533U JPH0160533U JP15529987U JP15529987U JPH0160533U JP H0160533 U JPH0160533 U JP H0160533U JP 15529987 U JP15529987 U JP 15529987U JP 15529987 U JP15529987 U JP 15529987U JP H0160533 U JPH0160533 U JP H0160533U
- Authority
- JP
- Japan
- Prior art keywords
- reaction tube
- cvd apparatus
- vertical cvd
- reaction chamber
- internal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15529987U JPH0530357Y2 (en]) | 1987-10-09 | 1987-10-09 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15529987U JPH0530357Y2 (en]) | 1987-10-09 | 1987-10-09 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0160533U true JPH0160533U (en]) | 1989-04-17 |
| JPH0530357Y2 JPH0530357Y2 (en]) | 1993-08-03 |
Family
ID=31432805
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15529987U Expired - Lifetime JPH0530357Y2 (en]) | 1987-10-09 | 1987-10-09 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0530357Y2 (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (ja) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | 縦型熱処理装置 |
-
1987
- 1987-10-09 JP JP15529987U patent/JPH0530357Y2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002280310A (ja) * | 2001-03-19 | 2002-09-27 | Tokyo Electron Ltd | 縦型熱処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0530357Y2 (en]) | 1993-08-03 |